Number of views: 5424 Author: Aili Industry Release time: 2026-10-05 Source: Ai Li Industrial
Panel production—including TFT-LCD, AMOLED, Mini/Micro LED, etc.—involves many processes, and each process uses different materials, process conditions, and protection objects. Treating the entire workshop as a unified environment to configure chemical filters is often not the most reasonable approach.
There are two reasons: first, different processes produce different gaseous pollutants and require different media; second, different processes have different sensitivity to gaseous pollution, and export requirements may be loose or tight. Separate identification and partition configuration are more targeted than unified configuration. For specific selection logic, please refer to Discussion on why chemical filters should be selected according to target gases .
The sources of gaseous pollution in the panel workshop are relatively scattered and need to be investigated separately by process area.
Cleaning process. Cleaning agents may contain organic solvents, alkaline ingredients or other volatile compounds. Different cleaning methods (wet, dry, plasma) release different components. If the cleaning agent is changed, the released components may also change.
Coating and developing process. Photoresists, developers, and thinners may contain organic solvents. These materials volatilize during the coating, drying, and development processes and are important sources of VOCs. For specific selection methods, please refer to Discussion on how to choose air chemical filters for toluene pollution .
Etching process. Etching gases may contain acidic components, fluoride or other special gases. These components pose corrosion risks to equipment and materials and require targeted treatment. For specific differences, please refer to whether chemical filters can remove sulfur dioxide from the air . Discussion of
Coating process. Processes such as PECVD and sputtering may produce specific gases or by-products. Some components have an impact on optical properties.
Material storage and equipment operation. Exposed storage of materials, equipment seals, and lubricants may continuously release trace amounts of organic matter at operating temperatures. This part of the source is easily overlooked.
Relevant materials and representative air data should be confirmed to avoid selection based solely on process names. For specific sampling methods, please refer to whether to do air sampling before choosing a chemical filter . Discuss
After confirming the source of pollution, it is also necessary to determine whether it is an external input or an internal release.
The external air is controlled by the fresh air section. If the workshop is close to an industrial area or traffic artery, the fresh air may carry acid gases, organic matter or other components. This part requires setting up a chemical filtration section in the fresh air unit. For specific configuration, please refer to Discussion on why MAU needs to configure chemical filtration section .
Internal releases require source exhaust, return or local protection. If the contamination comes from the process itself or equipment materials, fresh air treatment is not enough, and filtration needs to be configured locally or on the return air path. For specific differences, please refer to Discussion of what localized contamination can be treated by FFU plus chemical filter .
When spreading across regions, the pressure difference and return air zoning should also be checked. If return air is shared between different processes, contamination from one area may enter another area through the return air. At this time, it is necessary to evaluate the relationship between return air zoning and pressure difference to avoid the spread of pollution. For specific methods, please refer to Discussion on how odors in multi-story factory buildings interact with each other and how chemical filtration should be partitioned .
Different process areas have different protection objects, and export requirements should also be determined separately.
Photolithography and coating areas. May be sensitive to alkaline gases and organic vapors. Alkaline components may affect photoresist performance, and organic vapor may form a film on the surface. The chemical filtration sections in these areas need to be configured for the corresponding components. For details, please refer to Discussion on how to choose chemical filters for amine gas contamination .
Etching and coating area. May be sensitive to acid gases and certain by-products. Metal parts and optical components inside the device may be affected by corrosion or contamination.
Inspection and testing area. There are requirements for both particle and gaseous contamination, but the sensitive object may be the detection equipment itself or the product surface.
Data in different areas can be compared, but the same maintenance cycle cannot be applied to all processes by default. Each zone has different inlet concentration, media capacity and outlet requirements, and the replacement cycle may also be different. For specific life assessment, please refer to Discussion of how long chemical filters last .
After partitioning is configured, the maintenance strategy must be adjusted accordingly.
Replacement cycles are different. Chemical filter sections may be replaced more frequently in high-load areas and longer in low-load areas. Maintenance ledgers must be recorded separately by region.
The frequency of detection is different. The frequency of outlet concentration testing in key process areas may be higher, and in general areas it may be appropriately relaxed.
Record and trace. The filter section model, installation location, replacement date and test results of each area must be recorded accordingly. If there is a problem in a certain area later, it can be quickly located. involving MAU box chemical filter or The system, interface and resistance of the FFU supporting chemical filter need to be checked together during the planning stage.
A certain panel workshop installed the same activated carbon filter in multiple process areas.
After running for a period of time, it was found that some areas worked well, while the smell was still obvious in other areas. Investigation and confirmation: Areas with obvious odors mainly release alkaline gases, while ordinary activated carbon has limited adsorption capacity for alkaline gases and requires targeted media.
Adjustment plan: Re-identify major pollutants by area, use media for organic gases in the photolithography and cleaning areas, and add chemical filtration sections for alkaline gases in the etching and development areas. The air volume, resistance and replacement cycle of the filter sections in each area are checked separately. The air quality in each area has been improved after adjustments.
This case illustrates: The chemical filtration in the panel workshop must be configured separately according to the process, and cannot be one size fits all. involving When selecting a chemical filter product series , it is recommended that the pollution data, sensitive objects and system conditions of each process be provided to the supplier for verification.
Check items |
Confirm key points |
|---|---|
Process source |
Organize area material and process release |
Sensitive objects |
Clarify protection requirements for each region |
air zone |
Check the relationship between shared return air and pressure difference |
Verify target |
Set gas indicators and detection methods separately |
The core of the chemical filtration configuration in the panel workshop is to match the pollution characteristics, sensitive objects and air paths of each process, and then select matching media by partition.
Aili Industrial has independent manufacturing capabilities in filters, motors, fans, control systems and sheet metal processing, and can provide chemical filter product series and supporting air supply equipment. For panel industry projects, the pollution data, protection objects, air volume and installation space of each process can be combined to assist in checking the zoning filtration plan. When the filter is matched with MAU, FFU, EFU and other equipment, the resistance, interface and maintenance methods can be confirmed uniformly.
Related products:Chemical filter product series、MAU box chemical filter、FFU comes with chemical filter . Providing contamination information, protection objectives and system conditions for each process during the inquiry will help confirm the appropriate zoning filtration scheme. The specific selection is subject to the technical documents and test results confirmed by the project.