What parameters do you need to pay most attention to when selecting FFU for a semiconductor clean room?
Semiconductor clean rooms have more comprehensive requirements for FFU parameters
Semiconductor clean rooms have higher requirements for particle control, air flow organization and operational stability. The cleanliness of some areas can reach ISO Class 1 to Class 3 levels. As the core equipment of circulating filtered air supply, FFU's parameter selection directly affects the regional cleanliness and process protection effect.
When selecting FFU for a semiconductor clean room, you cannot just look at one parameter. Air volume, static pressure, filtration level, wind speed uniformity, noise, control method and electrical parameters all need to be checked in conjunction with process requirements. Parameters are related to each other and should be compared between the whole machine and the system.
Aili Industrial has complete production capabilities in FFU complete machines and semiconductor project supporting, and can provide air supply solutions based on the conditions of the wafer factory and semiconductor equipment. For the basic structure of the FFU machine, you can refer toAili Industrial FFU fan filter unit。
How to check air volume and static pressure
The air volume determines the air supply capacity of the FFU. The air volume of a semiconductor clean room should be calculated based on the cleanliness level, number of air changes or protection area. For unidirectional flow areas, calculations can be made based on target wind speed and protected area. For non-unidirectional flow areas, it can be calculated based on the number of air changes.
Static pressure determines the FFU's ability to overcome system resistance. FFU in semiconductor clean rooms may need to be equipped with high-efficiency filters, air supply paths or equipment structures, and system resistance will affect the actual air volume. When selecting a model, confirm the static pressure margin at the target air volume and consider the change in operating point after dust accumulation on the filter.
Air volume and static pressure should be compared under the complete machine configuration, not just the full pressure of the bare fan. For details, please refer toWhat is the difference between the external static pressure of the FFU machine and the full pressure of the fan? Understand the parameter caliber.
How to choose filtering level
Semiconductor clean rooms have higher requirements for filtration levels. Corresponding to ISO Class 1 to Class 3 levels, ULPA level filters are usually required, such as U15 or higher efficiency. For ISO Class 4 to Class 5 levels, H14 HEPA filters can meet the needs.
The filter efficiency grade needs to comply with EN1822 or IEST standards. When selecting, you should also confirm the sealing method and installation interface of the filter. Semiconductor clean rooms usually use liquid tank seals or knife edge seals, and the leakage rate needs to be controlled at a low level. Regarding the matching of filters and machine interfaces, please refer toFFU equipped with ULPA ultra-high efficiency filter。
How to consider wind speed uniformity
Semiconductor clean rooms, especially wafer factories, have high requirements for uniformity of wind speed. Uneven wind speed may cause local particle accumulation or airflow disturbance, affecting the wafer surface and process equipment.
Wind speed uniformity should be confirmed through multiple measuring points. The measuring points should cover the air outlet surface, the splicing boundary of multiple FFUs and the key areas of the wafer. Regarding the expression of wind speed uniformity, you can refer toHow does FFU wind speed uniformity express the solution point and deviation calculation method.
How to consider noise
Semiconductor clean rooms usually have continuous production requirements and personnel need to operate in the workshop. Excessive FFU noise may affect the working environment and personnel comfort. Noise parameters should be confirmed in combination with distance measurement and operating speed, rather than just looking at a single value.
If multiple FFUs are running at the same time, room noise may be superimposed. You can confirm the noise of a single unit and the expected room noise when selecting a model.
How to choose control method
FFUs in semiconductor clean rooms are usually connected to the group control system, and different operating modes are set according to areas or processes. If the project has partition control, constant air volume control or wind speed feedback requirements, it should be confirmed that the controller supports the corresponding functions.
For control methods, please refer toFFU/EFU group control touch screen controller andFFU computer group control system . Aili Industrial has complete self-research capabilities in FFU control systems and can provide control solutions according to the needs of semiconductor projects.
How to check electrical parameters
Electrical parameters include supply voltage, input power, power factor and protection level. Semiconductor cleanrooms may have requirements for electrical safety and grounding. When selecting, the power supply conditions, power data and protection level should be confirmed, and the match with the project power distribution system should be checked.
For the distinction between input power and power factor, please refer toHow to distinguish FFU power factor from input power to understand the meaning of the parameters.
How to check structure and installation parameters
FFUs in semiconductor clean rooms may be installed on suspended ceilings, on top of equipment, or on local supports. Structural parameters include overall machine size, installation dimensions, maintenance methods and air inlet clearance. If installed on the top of the equipment, the load-bearing, cover opening trajectory and safety interlocking also need to be checked.
For device-side applications, you can refer toEquipment end fan filter unit andCustomize the EFU equipment-side fan filter unit to learn about supporting solutions.
Issues that should be confirmed in advance during project communication
In the semiconductor clean room FFU selection stage, it is recommended to confirm the following with the FFU manufacturer and designer: regional cleanliness level and air flow pattern; process dust generation and equipment heating; air volume and static pressure requirements; filtration level and sealing method; wind speed uniformity requirements; noise requirements; control methods; electrical parameters; installation structure and maintenance conditions.
If you are selecting an FFU for your semiconductor cleanroom, you can visitAili Industrial FFU fan filter unit to learn about the complete machine configuration, you can also refer toFFU is equipped with ULPA ultra-high efficiency filter to learn about the filter configuration, or contact Aili Industrial for semiconductor industry selection support.
in conclusion
When selecting FFU for a semiconductor clean room, it is necessary to check the air volume, static pressure, filtration level, wind speed uniformity, noise, control method and electrical parameters based on the cleanliness level, process dust generation and air flow organization. Parameters should be compared between the whole machine and the system, not just a single value. Structural and installation conditions also need to be confirmed simultaneously.
Aili Industrial has complete production capabilities in FFU complete machines and semiconductor project supporting, and can provide selection solutions based on semiconductor clean room conditions. If you need to know more about semiconductor clean room FFU configuration, you can visitAili Industrial FFU fan filter unit , you are also welcome to contact Aili Industrial for project support.
