How to configure the lithography area ULPA? Efficiency, AMC fit and material declarations

Photolithography areaULPA filter configurations should incorporate process inputs such as particle control, AMC, material release and airflow stabilization. ULPA only solves the particle filtering link and cannot independently prove that the photolithography environment meets the requirements. The control of contamination in photolithography areas is two-fold: particles can block or scatter exposure light, and molecular contamination can change photoresist properties or optical component surface conditions. ULPA is responsible for the particle line, AMC and material outgassing are responsible for the molecular line, and the two cannot replace each other. When selecting the ULPA grade, if you only consider particle efficiency without evaluating material outgassing and AMC coordination, the actual performance of the photolithography area may not meet expectations. Aili Industrial's product line covers the equipment sideEFU equipment end fan filter unit andHEPA/ULPA filter，PTFE HEPA/ULPA filters can be evaluated for low outgassing requirements,Chemical filters can be configured for target gaseous pollutants, and the dual line requirements of particles and molecules in the photolithography area can be addressed in the same system.

1. Clarify contamination and process boundaries: particles and AMC are confirmed separately

It is up to the equipment and process parties to determine the particles and gaseous pollutants of concern, distinguish between rooms, equipment interiors and local exposure areas, and avoid general requirements 'suitable for photolithography'.

The pollution control goals in the photolithography area need to be specific: the particle size and concentration to be determined, the type of AMC (acidic, alkaline, organic condensate, dopant) and target concentration, and whether the control range is at the room level or within the equipment. Without these inputs being clear, there is no baseline for ULPA ratings and AMC configurations. Aili Industry isHEPA/ULPA filters, confirm the gear according to the judged particle size.When selecting Non-standard ULPA filter projects can confirm the installation conditions according to the equipment structure, and AMC requirements can be passedChemical filters are individually configured. The relationship between levels and particle limits can be found inISO cleanliness level comparison。

2. Coordinate materials and AMC solutions: ULPA itself does not solve gas pollution

Check the information on chemical media, colloids, seals and frame materials according to target pollutants, and require explanation of test scope and conditions to avoid unfounded low-release promises.

The gas release sources of ULPA for semiconductor equipment include filter materials, sealants and hot melt adhesives. The ion release amount of sealants may be higher than that of filter materials, and the organic release of hot melt adhesives needs to be evaluated separately. PTFE filter material has very low organic release under harsh conditions, but sealants and hot melt adhesives may still release organic pollutants. This means that when selecting ULPA, you should not just look at the filter material. The outgassing data of the sealing material and adhesive must also be confirmed. Aili Industry isIn the PTFE HEPA/ULPA filter package, the suitability of the filter material can be evaluated according to the low outgassing requirements.the liquid tank seal ULPA filter are confirmed according to the environmental conditions. AMC gas treatment is provided byThe sealing liquid and tank material of chemical filters andFFU chemical filter correspondence. For the coordination of materials and AMC, please refer toHEPA FAQs and Selection Guide。-2-5

3. Verify the installed airflow and interfaces: air volume, uniformity, maintenance space and integrity

Air volume, uniformity, maintenance space and integrity should be jointly confirmed, and affected items evaluated after material or layout changes.

ULPA inside lithography equipment is usually used in conjunction with EFU. The air volume distribution and sealing integrity after installation directly determine the particle control effect. The photolithography area has high requirements for airflow stability. Uneven wind speeds or local eddies on the air supply surface may cause particles to be deposited on the wafer surface. Aili Industry isWhen matching the EFU equipment end fan filter unit, confirm the air outlet direction and uniformity conditions according to the equipment structure.Ultra-thin EFU is equipped with local air supply in the compact space of lithography equipment.The FFU computer group control system records the operating air volume and status, which can be compared according to actual working conditions during verification. For installation verification methods, please refer toULPA ultra-high efficiency filter FAQ and selection guide。

4. When the particle test is qualified but there are still concerns about molecular contamination, AMC control and testing should be supplemented

When the particle test is qualified but there are still concerns about molecular contamination in the process, additional control and detection of contaminants should be implemented instead of just increasing the ULPA level. The efficiency index of ULPA is for particles, and increasing the grade will not enhance the removal ability of gaseous molecules.

Aili Industrial can simultaneously evaluate particle filtration and gas control needs in the photolithography area plan.The chemical filter is configured for the target AMC,PTFE HEPA/ULPA filters can be evaluated according to working conditions. The two complement each other rather than replace each other. The material outgassing of The division of labor between molecular pollution control and particle filtration can be referred toULPA ultra-high efficiency filter FAQ and selection guide。

5. Related questions and answers

Is there no need for chemical filtration with ULPA?
The need for AMC controls depends on the contaminant and process requirements and should be evaluated separately. ULPA is responsible for particulate and gaseous pollution and requires corresponding chemical filtration solutions.

Should I choose U15 or U16 for ULPA in the photolithography area?
It depends on the determination of particle size and process standards. At the same time, the fan margin and resistance changes must be checked. You cannot select based on grade numbers alone.

Does the outgassing of ULPA materials need to be confirmed separately?
need. Filter materials, sealants and hot melt adhesives may all outgas. Corresponding test data should be provided upon request. The overall outgassing level cannot be inferred based on the type of filter material alone.

6. Related articles

ULPA ultra-high efficiency filter FAQ and selection guide

PTFE HEPA/ULPA high efficiency filter

chemical filter

Ultra-thin EFU

7. Key points for selection and acceptance inspection

8. Product matching and technical support from Aili Industrial

Aili Industrial's product line covers the equipment sideEFU equipment end fan filter unit andHEPA/ULPA filter，PTFE HEPA/ULPA filters can be evaluated for low outgassing requirements,Chemical filters can be configured for target gaseous pollutants, and the dual line requirements of particles and molecules in the photolithography area can be addressed in the same system.HEPA/ULPA filter selection is based on the judged particle size to confirm the gear.Non-standard ULPA filter projects confirm the installation conditions according to the equipment structure; the gas release data of sealing materials and adhesives can be confirmed with the product data.the liquid tank seal ULPA filter are selected according to environmental conditions.The sealing liquid and tank body material of The fan filter unit at the EFU equipment end is matched with the equipment structure to confirm the air outlet direction and uniformity conditions.Ultra-thin EFU is equipped with local air supply in the compact space of lithography equipment.The FFU computer group control system records the operating air volume and status to facilitate installation verification. AMC Gas Processing is provided bychemical filters andFFU chemical filters correspond to particles and gases being configured separately rather than replacing each other. Provide process objectives, installation drawings, operating conditions and acceptance requirements, and can further communicate ULPA standard specifications, non-standard interfaces, samples and batch matching. The specific parameters and test range are based on the confirmed model and technical documents.