How should the filtration target be determined when the photoresist is sensitive to alkaline gases?

When the photoresist is sensitive to alkaline gases, the filtration target should be determined based on the specific photolithography process, material and equipment requirements. General deodorization standards or some universal AMC values ​​cannot be directly regarded as requirements for the entire photolithography area. There is a clear chemical mechanism for the effect of alkaline gas on photoresist, and the filtration goals should be determined around this mechanism and process sensitivity.

1. Clarify sensitive objects and detection calibers

It is necessary to distinguish ammonia, amine and other related components, and confirm the concentration unit, sampling time and method detection capability. Only total quantity or odor description is usually not sufficient to establish control objectives.

The chemical amplification system of photoresist is sensitive to alkaline substances. Ammonia and amines will neutralize the photoacid in the photoresist and affect the pattern accuracy. Different components have different degrees of influence. When testing, it is necessary to confirm the specific concentrations of ammonia and amines separately, rather than just reporting a total TVOC amount. Aili Industry isa chemical filter, confirm the media configuration according to the target gas.When selecting FFU chemical filter can be used with FFU for circulating air treatment in photolithography area. The relationship between levels and filtering requirements can be found inISO cleanliness level comparison。

2. Assign targets to actual protection locations

Fresh air, room circulation, and equipment microenvironments have different responsibilities and inputs versus internal releases should be investigated. Just because the filter element outlet meets certain requirements does not necessarily mean that the location where the photoresist is used is protected.

The alkaline gas in the photolithography area may come from fresh air, the photoresist itself, cleaning materials and surrounding processes. Fresh air treatment, room circulation and internal filtration of the equipment are each responsible for different scopes. The acceptance point should be set at the actual location where the photoresist is used, rather than just testing the filter outlet. Aili Industry isThe box-type chemical filter package is configured according to MAU fresh air treatment.V-type chemical filters are suitable for filter sections with limited space. For the correspondence between gas control and protection positions, please refer toHEPA FAQs and Selection Guide。

3. Examples of project judgment

Before introducing new cleaning materials, check the relevant alkaline components and arrange representative air verification in the area where the photoresist is used.

The introduction of new materials may bring new sources of alkaline gases. Confirming the ingredients before importing and testing them at the actual location of use is more meaningful than testing them at the outlet of the filter element afterwards.

4. Application Check Points

5. Verification and subsequent use

Process areas, equipment entrances and protected locations may have different air conditions. Inspection points should be set up around the actual product or equipment usage location, and normal operation records should be kept. Environmental filtration can work with source, material and airflow measures, but cannot automatically cover contamination in unfiltered sections.

Aili Industry ischemical filter photolithography area plan, confirm the media configuration according to the target alkaline component.In the Flat chemical filters are suitable for equipment or space-constrained scenarios. The specific effect is subject to on-site inspection of the location where the photoresist is used.

6. Related questions and answers

Is it okay to use general deodorization standards for alkaline gases in the photolithography area?
not enough. Concentration targets need to be determined for specific components such as ammonia and amines. General deodorization standards cannot replace process protection indicators.

Can measuring only the total amount of TVOC determine the alkaline gas control effect?
cannot. TVOC is a comprehensive indicator that cannot reflect the specific concentrations of ammonia and amines and requires special testing.

Does the fact that the filter element outlet meets the standard mean that the location of the photoresist is safe?
uncertain. There may be an internal release between the outlet of the filter element and the location where the photoresist is used, and the acceptance point should be set in a protected position.

7. Related articles

Chemical filter product series

FFU chemical filter

Box chemical filter

HEPA FAQs and Selection Guide

8. Key points for selection and acceptance inspection

9. Aili Industrial products and equipment supporting equipment

Aili Industry provides chemical filters and clean air supply equipment selection packages. It can compare FFU package, box type, flat type and V-shaped products according to gas composition, treatment air volume and installation conditions. The manufacturing and supporting system covers the independent research and development and production of motors and fans, control systems, sheet metal, air filters and complete machine assembly, making it easy to jointly confirm the filter section, power and structural conditions. The specific gas effect, environmental suitability and service life still need to be verified based on the corresponding configuration data and actual working conditions.

learnChemical filter product series , check the products and air supply matching according to the project conditions. Clarify the goal → Check the conditions → Verify the effect → Arrange maintenance.